| 摘要 |
PURPOSE: A depositing apparatus and a depositing method are provided to form a thin film with high quality by stably depositing radical that is an intermediate compound on a substrate included in a reaction unit. CONSTITUTION: A generating unit(100) generates an intermediate compound using raw materials. A storage unit(300) collects and stores the intermediate compound. The intermediate compound stored in the storage unit is inputted to a reaction unit(500) through a second supply line(220). An amount of the intermediate compound supplied to the reaction unit is controlled by a control valve(400) included in the second supply line. The reaction unit includes a chamber, a heating device, a susceptor, and a substrate holder.
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