| 摘要 |
A substrate cleaning apparatus is provided to reduce a fabricating cost of a substrate and contamination of the environment by reducing greatly the quantity of used cleaning water. An injection part(100) includes a first injection part(110) and a final injection part(130). The first injection part firstly injects cleaning water to a substrate(S) transferred along a substrate transfer path. The final injection part finally injects cleaning water to the substrate. A storage part(200) collects the cleaning water injected from the final injection part to the substrate and circulates the cleaning water to the first injection part positioned in the rear of the final injection part through a circulation line(201,202). A main regenerating part(500) collects and regenerates the cleaning water injected from the first injection part to the substrate and supplies the regenerated cleaning water to the final injection part. The main regenerating part can be provided with cleaning water of high purity from a cleaning water supply source. |
