| 摘要 |
PURPOSE: A method for cleaning a substrate is provided to evenly wash the surface of the substrate by repetitively cleaning the substrate in forward and backward directions. CONSTITUTION: A roll washing member(16) is in contact with the surface of a substrate(W), and the surface of the substrate is scrubbed by the roll washing member while the roll washing member and the substrate rotate. The roll washing member is extended in the vertical direction of the substrate. The rotary speed or direction of the roll washing member or substrate changes while the surface of the substrate is scrubbed.
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