| 发明名称 |
SILICON WAFER AND SEMICONDUCTOR DEVICE |
| 摘要 |
In a silicon wafer which has a surface with a plurality of terraces formed stepwise by single-atomic-layer steps, respectively, no slip line is formed. |
| 申请公布号 |
KR20130007555(A) |
申请公布日期 |
2013.01.18 |
| 申请号 |
KR20127021469 |
申请日期 |
2011.02.02 |
| 申请人 |
TOHOKU UNIVERSITY |
发明人 |
OHMI TADAHIRO;TERAMOTO AKINOBU;SUWA TOMOYUKI |
| 分类号 |
H01L21/02;C30B29/06;H01L29/78 |
主分类号 |
H01L21/02 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
|
| 地址 |
|
