FACILITY AND METHOD FOR DEPOSITING A WIDTH-ADJUSTABLE FILM OF ORDERED PARTICLES ONTO A MOVING SUBSTRATE

摘要

The invention relates to a facility for depositing a film of ordered particles (4) onto a moving substrate (8), the facility being designed to allow the deposition, onto the substrate, of a film of ordered particles discharged through the particle outlet of a transfer area having a first width (L1). According to the invention, the facility further includes an accessory device (100) in the form of a deposition head for blocking said particle outlet and designed to allow the deposition, onto said substrate (38), of a film of ordered particles discharged via an end (62) of a particle transfer channel (56) of said deposition head, said end having a second width (L2) that is strictly smaller than the first width (L1).