发明名称 |
N-Channel Erasable Programmable Non-Volatile Memory |
摘要 |
In an embodiment of the invention, a method of fabricating a floating-gate NMOSFET (n-type metal-oxide semiconductor field-effect transistor) is disclosed. A silicide blocking layer (e.g. oxide, nitride) is used not only to block areas from being silicided but to also form an insulator on top of a poly-silicon gate. The insulator along with a top electrode (control gate) forms a capacitor on top of the poly-silicon gate. The poly-silicon gate also serves as the bottom electrode of the capacitor. The capacitor can then be used to capacitively couple charge to the poly-silicon gate. Because the poly-silicon gate is surrounded by insulating material, the charge coupled to the poly-silicon gate may be stored for a long period of time after a programming operation.
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申请公布号 |
US2013016570(A1) |
申请公布日期 |
2013.01.17 |
申请号 |
US201213366668 |
申请日期 |
2012.02.06 |
申请人 |
TEXAS INSTRUMENTS INCORPORATED;PAN SHANJEN;MITCHELL ALLAN T.;QIAN JACK G. |
发明人 |
PAN SHANJEN;MITCHELL ALLAN T.;QIAN JACK G. |
分类号 |
G11C16/04;G11C11/34;H01L21/336;H01L29/788 |
主分类号 |
G11C16/04 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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