| 摘要 |
The invention provides a polishing composition comprising silica, an aminophosphonic acid, a polysaccharide, a tetraalkylammonium salt, a bicarbonate salt, a compound comprising an azole ring, and water, wherein the polishing composition has a pH of 7 to 11. The invention further provides a method of polishing a substrate with the polishing composition. |
| 申请人 |
CABOT MICROELECTRONICS CORPORATION;REISS, BRIAN;JOHNS, TIMOTHY P.;WHITE, MICHAEL;JONES, LAMON;CLARK, JOHN |
发明人 |
REISS, BRIAN;JOHNS, TIMOTHY P.;WHITE, MICHAEL;JONES, LAMON;CLARK, JOHN |
