发明名称 STAGE APPARATUS AND PROCESS APPARATUS
摘要 According to one embodiment, a stage apparatus includes a height control unit includes height control elements each which is drove in an upward/downward direction independently, a measuring unit which divides an upper surface of the substrate into areas, and measures a height of each of the areas. The control unit is configured to set the height of each of the areas independently by controlling a height of each of the height control elements based on a data value, determine using the measuring unit whether the height of each of the areas in the upper surface of the substrate is in a allowable range, and set the height of the area out of the allowable range again by the height control elements.
申请公布号 US2013014360(A1) 申请公布日期 2013.01.17
申请号 US201213428530 申请日期 2012.03.23
申请人 INANAMI RYOICHI;ITO SHINICHI;KOIZUMI HIROSHI;KOJIMA AKIHIRO 发明人 INANAMI RYOICHI;ITO SHINICHI;KOIZUMI HIROSHI;KOJIMA AKIHIRO
分类号 H01L21/683 主分类号 H01L21/683
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