| 发明名称 |
COMPOSITIONS AND PROCESSES FOR PHOTOLITHOGRAPHY |
| 摘要 |
Topcoat layer compositions are provided that are applied above a photoresist composition. The compositions find particular applicability to immersion lithography processing.
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| 申请公布号 |
US2013017487(A1) |
申请公布日期 |
2013.01.17 |
| 申请号 |
US201213548537 |
申请日期 |
2012.07.13 |
| 申请人 |
ROHM AND HAAS ELECTRONIC MATERIALS LLC;WANG DEYAN;WU CHUNYI |
发明人 |
WANG DEYAN;WU CHUNYI |
| 分类号 |
C09D141/00;C08K5/053;C08K5/06;G03F7/11;G03F7/20 |
主分类号 |
C09D141/00 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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