发明名称 |
FLUID HANDLING STRUCTURE, A LITHOGRAPHIC APPARATUS AND A DEVICE MANUFACTURING METHOD |
摘要 |
A fluid handling structure for a lithographic apparatus, the fluid handling structure having, at a boundary from a space configured to contain immersion fluid to a region external to the fluid handling structure: a meniscus pinning feature to resist passage of immersion fluid in a radially outward direction from the space; a plurality of gas supply openings in a linear array at least partly surrounding and radially outward of the meniscus pinning feature; and a gas recovery opening radially outward of the plurality of gas supply openings in a linear array.
|
申请公布号 |
US2013016333(A1) |
申请公布日期 |
2013.01.17 |
申请号 |
US201213542546 |
申请日期 |
2012.07.05 |
申请人 |
ASML NETHERLANDS B.V.;CORTIE ROGIER HENDRIKUS MAGDALENA;RIEPEN MICHEL;ROPS CORNELIUS MARIA |
发明人 |
CORTIE ROGIER HENDRIKUS MAGDALENA;RIEPEN MICHEL;ROPS CORNELIUS MARIA |
分类号 |
G03B27/52 |
主分类号 |
G03B27/52 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|