发明名称 TWO-PHOTON ABSORPTION POLYMERIZABLE COMPOSITION
摘要 <P>PROBLEM TO BE SOLVED: To provide a two-photon absorption polymerizable composition having a large cross section for absorbing two-photons, and being highly efficient so as to efficiently photopolymerize from an excited state generated by two-photon absorption. <P>SOLUTION: The two-photon absorption polymerizable composition contains at least (A) a two-photon absorption material, (B) a polymerizable compound and (C) a polymerization initiator, wherein (A) the two-photon absorption material consists of a two-photon absorption compound that has a noncyclic &pi;-electron conjugated system at least one terminal of which is modified by an electron donating group and an electron withdrawing compound. <P>COPYRIGHT: (C)2013,JPO&INPIT
申请公布号 JP2013010893(A) 申请公布日期 2013.01.17
申请号 JP20110145494 申请日期 2011.06.30
申请人 RICOH CO LTD 发明人 SATO TSUTOMU;MIKI TAKESHI
分类号 C08F2/50;G02B6/12;G02F1/361 主分类号 C08F2/50
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