| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a method of manufacturing a substrate into a highly accurate surface texture at low cost, which is the substrate comprising brittle inorganic materials such as glass, crystallized glass and crystal, by using a polishing process ensuring a polishing effect equal to that when polished with a cerium oxide, without using the cerium oxide as a loose grain in a polishing liquid. <P>SOLUTION: The method of manufacturing the substrate includes the polishing process for polishing a plate-like inorganic material containing at least one of SiO<SB POS="POST">2</SB>component or Al<SB POS="POST">2</SB>O<SB POS="POST">3</SB>component, by using the polishing liquid and a polishing pad. In the method of manufacturing the substrate, the polishing liquid at least contains a polishing abrasive grain comprising a compound containing Zr and Si, wherein the abrasive concentration in the polishing liquid is in a range of 2 to 40 wt.%. <P>COPYRIGHT: (C)2013,JPO&INPIT |
