发明名称 |
CERIUM SALT, PRODUCING METHOD THEREOF, SERIUM OXIDE AND CERIUM BASED POLISHING SLURRY |
摘要 |
A cerium salt wherein, when 20 g of the cerium salt is dissolved in a mixed liquid of 12.5 g of 6N nitric acid and 12.5 g of a 30% hydrogen peroxide aqueous solution, a concentration of an insoluble component present in the solution is 5 ppm or less by mass ratio to the cerium salt before dissolution and cerium oxide produced by processing the cerium salt at high temperatures. Scratch on a surface to be polished can be reduced when a cerium based polishing slurry containing the cerium oxide particles is used, since an amount of impurities in cerium oxide particles and cerium salt particles, raw material thereof, is reduced for high purification.
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申请公布号 |
US2013014446(A1) |
申请公布日期 |
2013.01.17 |
申请号 |
US201213625214 |
申请日期 |
2012.09.24 |
申请人 |
HITACHI CHEMICAL CO., LTD.;HITACHI CHEMICAL CO., LTD. |
发明人 |
CHINONE KANSHI;MIYAOKA SEIJI |
分类号 |
C09K3/14;C01F17/00;C09G1/02;H01L21/3105;H01L21/321 |
主分类号 |
C09K3/14 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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