Optical system for micro-lithographic projection exposure system, has optical element and correction radiation source, over which optical element supplies electromagnetic correction radiation for correcting temperature profile

摘要

The optical system has an optical element (104) and a correction radiation source (101), over which the optical element supplies the electromagnetic correction radiation (110) for correcting a temperature profile. The temperature profile is adjusted in the operation of a projection exposure system in the optical element. A beam-deflecting arrangement (100) is provided with multiple beam-deflecting optical portions (100a) which are adjustable independently from each other for changing the angular distribution of the correction radiation incident from the optical element. Independent claims are included for the following: (1) a micro-lithographic projection exposure system with a lighting device; and (2) a method for manipulating the thermal state of an optical element in a micro-lithographic projection exposure system.