| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a resist composition that can give a sufficient focus margin (DOF). <P>SOLUTION: There is provided a resist composition comprising: (A) a resin having a structural unit derived from a compound represented by formula (a); and (B) an acid generator. In formula (a), R<SP POS="POST">1</SP>represents a hydrogen atom or a methyl group. A<SP POS="POST">1</SP>is represented by formula (a-g1):-(A<SP POS="POST">10</SP>-X<SP POS="POST">10</SP>)<SB POS="POST">s</SB>-A<SP POS="POST">11</SP>- (In formula (a-g1), s represents an integer of 0 to 2, A<SP POS="POST">10</SP>and A<SP POS="POST">11</SP>each independently represent an aliphatic hydrocarbon group having 1 to 5 carbon atoms or the like, and X<SP POS="POST">10</SP>represents an oxygen atom, carbonyl group, carbonyloxy group, oxycarbonyl group or the like.), and R<SP POS="POST">2</SP>represents an optionally substituted aliphatic hydrocarbon group having 1 to 18 carbon atoms, or the like. <P>COPYRIGHT: (C)2013,JPO&INPIT |
