| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a laminate for fine mask formation capable of forming a fine mask pattern having a thin residual film on a surface of a base material as an object to be worked with accuracy and ease. <P>SOLUTION: A laminate for fine mask formation includes: a resin layer (11) which is provided on one main surface of a base material (10) and has an uneven structure on the surface; and a mask layer (12) provided so as to cover the resin layer (11). A distance (lrl) between a top part position (S) of protrusions in the uneven structure in a cross-sectional view along the thickness direction and a surface position (Srl) having the mask layer (12) exposed therefrom satisfies 0<lrl≤0.1h (where height (depth) of the uneven structure expressed by the distance between the position (S) and the position of a recess bottom part is h). <P>COPYRIGHT: (C)2013,JPO&INPIT |
