COMPOSITION FOR FORMING FINE PATTERN AND METHOD FOR FORMING FINED PATTERN USING SAME

摘要

[Problem] To provide a composition for fine pattern formation which can form a resist pattern having high etching resistance and a method for forming a resist pattern using the composition. [Solution] A composition for fine pattern formation which comprises both a water-soluble resin having an aromatic-containing substituent as a side chain and pure water. This composition contains acid groups bonded to the water-soluble resin or contains a free acid therein.