发明名称 PHASE MODULATION MASK, EXPOSURE DEVICE AND EXPOSURE METHOD
摘要 <P>PROBLEM TO BE SOLVED: To provide a phase modulation mask capable of precisely exposing an object to be exposed in a desired pattern regardless of a distance from the phase modulation mask. <P>SOLUTION: Light from an illumination optical system 11 is phase-modulated by a phase modulation mask 20 in a predetermined periodic modulation pattern. An object 14 to be exposed is exposed in a predetermined exposure pattern by utilizing the mutual interference of diffracted light of the phase-modulated light. Here, the phase modulation mask 20 is constituted so that the object 14 to be exposed is exposed only by the primarily diffracted light out of diffracted light of the phase-modulated light. <P>COPYRIGHT: (C)2013,JPO&INPIT
申请公布号 JP2013011757(A) 申请公布日期 2013.01.17
申请号 JP20110144684 申请日期 2011.06.29
申请人 DAINIPPON PRINTING CO LTD 发明人 TANIGUCHI YUKIO;ITO KIMIO;HOGA MORIHISA
分类号 G03F1/68;G03F7/20;H01L21/027 主分类号 G03F1/68
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