发明名称 |
PHASE MODULATION MASK, EXPOSURE DEVICE AND EXPOSURE METHOD |
摘要 |
<P>PROBLEM TO BE SOLVED: To provide a phase modulation mask capable of precisely exposing an object to be exposed in a desired pattern regardless of a distance from the phase modulation mask. <P>SOLUTION: Light from an illumination optical system 11 is phase-modulated by a phase modulation mask 20 in a predetermined periodic modulation pattern. An object 14 to be exposed is exposed in a predetermined exposure pattern by utilizing the mutual interference of diffracted light of the phase-modulated light. Here, the phase modulation mask 20 is constituted so that the object 14 to be exposed is exposed only by the primarily diffracted light out of diffracted light of the phase-modulated light. <P>COPYRIGHT: (C)2013,JPO&INPIT |
申请公布号 |
JP2013011757(A) |
申请公布日期 |
2013.01.17 |
申请号 |
JP20110144684 |
申请日期 |
2011.06.29 |
申请人 |
DAINIPPON PRINTING CO LTD |
发明人 |
TANIGUCHI YUKIO;ITO KIMIO;HOGA MORIHISA |
分类号 |
G03F1/68;G03F7/20;H01L21/027 |
主分类号 |
G03F1/68 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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