发明名称 |
Methods and structures for rapid switching between different process gases in an inductively-coupled plasma (IPC) ion source |
摘要 |
<p>An openable gas passage provides for rapid pumpout of process or bake out gases in an inductively coupled plasma source in a charged particle beam system. A valve, typically positioned in the source electrode or part of the gas inlet, increases the gas conductance when opened to pump out the plasma chamber and closes during operation of the plasma source.</p> |
申请公布号 |
EP2546863(A1) |
申请公布日期 |
2013.01.16 |
申请号 |
EP20120173972 |
申请日期 |
2012.06.28 |
申请人 |
FEI COMPANY |
发明人 |
GRAUPERA, ANTHONY;KELLOGG, SEAN;UTLAUT, MARK;PARKER, N. WILLIAM |
分类号 |
H01J37/08;H01J37/18 |
主分类号 |
H01J37/08 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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