| 摘要 |
A phosphoric acid bath for a wet-etch process and a seasoning method thereof are provided to suppress the generation of nitride particles by performing an in-situ etch process using a phosphoric acid solution. A phosphoric acid bath is used for etching a nitride layer and an oxide layer in a wet-etch process. The phosphoric acid bath includes two or more baths. The baths are seasoned to lower an etch ratio of the oxide layer by using a nitride. The phosphoric acid bath further includes one or more auxiliary phosphoric acid bath used for a phosphoric acid solution exchanging process of the baths. The baths of the phosphoric acid bath are used for etching the nitride layer and the oxide layer in an in-situ manner.
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