发明名称 SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING SAME
摘要 An IGBT having a good balance between high switching speed and low on-resistance. Specifically disclosed is an IGBT 10 in which a defect layer 25 is formed in an n layer 102 in an active region 20 and formed in a p-type substrate 101 in a non-active region 40. In other words, the defect layer 25 in the active region 20 is at a shallower position than the defect layer 25 in the non-active region 40 when viewed from the surface. Due to this configuration, the switching speed is increased by reducing the amount of holes injected in the non-active region 40 in the IGBT 10. Meanwhile, the reduction of hole injection amount in the active region 20 is smaller than that in the non-active region 40, and thus increase in the on-resistance is suppressed at that time.
申请公布号 KR101222847(B1) 申请公布日期 2013.01.16
申请号 KR20117005046 申请日期 2009.10.13
申请人 发明人
分类号 H01L21/331;H01L29/72 主分类号 H01L21/331
代理机构 代理人
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