| 摘要 |
PROBLEM TO BE SOLVED: To provide a cathode generally suitable for use in high-temperature plasma etching applications. SOLUTION: In one embodiment, the cathode includes a ceramic electrostatic chuck fixed to the base. A cooling duct is formed inside the base. A rigid supporting ring is arranged between the chuck and the base for keeping the chuck and the base in isolated relation. COPYRIGHT: (C)2009,JPO&INPIT |
