| 摘要 |
PROBLEM TO BE SOLVED: To provide a developing device capable of supplying a developer solution to a substrate by both the injection supply and spray supply. SOLUTION: The developing device is equipped with a nozzle 5 capable of carrying out injection supply for injecting a developer solution to a substrate W, as well as, spray supply for spraying liquid drops of the developer solution with nitrogen gas to the substrate W; a developer solution pipe 11 for supplying the developer solution to the nozzle 5; a gas pipe 21 for supplying the nitrogen gas to the nozzle 5; valves 15, 25 provided in the pipes 11, 21, respectively; and a control unit 41 for opening and closing the valves 15, 25. For the control unit 41, by opening and closing the valves 15, 25 change-over is made between injection supply and spray for supplying the developer solution to the substrate W can be supplied. COPYRIGHT: (C)2009,JPO&INPIT |
