| 摘要 |
PROBLEM TO BE SOLVED: To define respective thin film shapes by a single photolithography step in a step of forming a laminate structure comprising two or more kinds of thin films with different patterns (planar shapes) from each other. SOLUTION: Two layers of thin films 3 and 2 are successively formed on a substrate 1, then the thin film 2 is etched using a first mask pattern 4 formed on the upper surface of the thin film 2, and a first thin film pattern 6 is formed. Thereafter, a second mask pattern 5 is formed on the first mask pattern 4 and the thin film 2 with the first mask pattern 4 left, by offset printing by an organic material, ink-jet printing or additional application by a dispenser nozzle. Finally, the thin film 3 is formed into a second thin film pattern 7 using the first mask pattern 4 and the second mask pattern 5, and the two mask patterns 4 and 5 are removed sequentially. The above process forms a desired laminate structure on a principal plane of the substrate 1 although photolithography is limited to a single step of forming the first mask pattern 4. COPYRIGHT: (C)2009,JPO&INPIT |
