| 摘要 |
The present invention relates to an exposure device and an exposure method. The exposure device 100 feeds a body (T) to be exposed with preset width and film shape to an exposure bench 50, and exposes a circuit pattern of a mask (M) on the body. The exposure body has a pressing board 42 pressing the body; an image recognization section 54 for observing a first correction recognization mark (AM) formed on the body and a second correction recognization mark (MM) formed on the circuit pattern; and a first moving section 43 moving the pressing board and the image recognization section in preset width direction of the body. |
