发明名称 MOTHER SUBSTRATE, FILM FORMATION REGION ARRANGEMENT METHOD, AND COLOR FILTER MANUFACTURING METHOD
摘要 A mother substrate, a film formation region arrangement method, and a color filter manufacturing method are provided to reduce influence of direction mismatch of a substrate about a droplet discharge device about location mismatch of receiving location. A pivot point(32a) is adjacent to the center of a mother facing board(201A). A CF layer area(208a) is arranged in a row in a CF area line(208B). The CF area line is extended in a main scanning direction. The CF area line is arranged in a location adjacent to the pivot point when a mother facing substrate is located in a work location platform.
申请公布号 KR20090089798(A) 申请公布日期 2009.08.24
申请号 KR20090012920 申请日期 2009.02.17
申请人 SEIKO EPSON CORPORATION 发明人 SAKAMOTO KENJI
分类号 G02F1/1335;B05C5/02 主分类号 G02F1/1335
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