发明名称 Implant
摘要 An implant fixture is made from ceramics containing zirconia. The implant fixture has monoclinic percentage of 1 volume % or less. The implant fixture includes a buried portion having an arithmetic average roughness Ra in the range of 1 to 5 µm. The zirconia content accounts for 86 mass % or more in the implant fixture. The implant fixture contains alumina and/or yttria. Further, the implant fixture has a sintered grain size of 0.45 µm or less.
申请公布号 EP2545881(A1) 申请公布日期 2013.01.16
申请号 EP20120175922 申请日期 2012.07.11
申请人 KIKUSUI CHEMICAL INDUSTRIES CO., LTD.;SHOFU INC. 发明人 Kashiwabara, Tateki;Goto, Tetsuro;Deguchi, Mikito;Yoshimoto, Ryuichi;Hori, Koji;Ito, Michio
分类号 A61C8/00;A61L27/10;C04B35/486;C04B35/488 主分类号 A61C8/00
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