METHOD OF FORMING MICROPATTERN, METHOD OF DAMASCENE METALLIZATION, AND SEMICONDUCTOR DEVICE AND SEMICONDUCTOR MEMORY DEVICE FABRICATED USING THE SAME

摘要

PURPOSE: A method for forming a micropattern, a damascene metallization method, and a semiconductor device and a semiconductor memory device fabricated using the same are provided to improve the formation of an activation line by preventing the pitch of a metal line from being decreased. CONSTITUTION: A dummy region is formed in an activation line area. A micro-pattern is formed on a substrate. A first mask(130) is formed in a dummy region. A mold mask pattern(140) is formed on the substrate and the first mask. A spacer(150) is formed in the sidewall of the mold mask pattern.