GAS INJECTION ASSEMBLY AND APPARATUS FOR PROCESSING SUBSTRATE

摘要

PURPOSE: A gas spray assembly and a substrate processing device are provided to improve a substrate processing speed using the first plasma and the second plasma with different ion energy properties and different density properties. CONSTITUTION: A chamber(100) includes an inner space for processing a substrate(S). A substrate support unit(500) supports the substrate. A gas spray assembly(700) is arranged on the upper side of the substrate support unit and sprays source gas and includes a top body(200), a first body(310), and a second body(320). A power supply unit(540) supplies bias power to the substrate support unit.