发明名称 |
Silicone structure-bearing polymer, negative resist composition, photo-curable dry film, patterning process, and electric/electronic part-protecting film |
摘要 |
A silicone structure-bearing polymer comprising recurring units derived from a bis(4-hydroxy-3-allylphenyl) derivative and having a Mw of 3,000-500,000 is provided. A chemically amplified negative resist composition comprising the polymer overcomes the stripping problem that a coating is stripped from metal wirings of Cu or Al, electrodes, and SiN substrates. |
申请公布号 |
US9377689(B2) |
申请公布日期 |
2016.06.28 |
申请号 |
US201514807072 |
申请日期 |
2015.07.23 |
申请人 |
SHIN-ETSU CHEMICAL CO., LTD. |
发明人 |
Takemura Katsuya;Urano Hiroyuki;Iio Masashi;Fujiwara Takayuki;Hasegawa Koji |
分类号 |
G03F7/075;C08G77/52;G03F7/40;G03F7/38;C07C39/21;C09D183/14;C08L83/14;H01L21/312;C08G77/12;G03F7/16;G03F7/20;G03F7/32;G03F7/038;G03F7/09;G03F7/11 |
主分类号 |
G03F7/075 |
代理机构 |
Westerman, Hattori, Daniels & Adrian, LLP |
代理人 |
Westerman, Hattori, Daniels & Adrian, LLP |
主权项 |
1. A silicone structure-bearing polymer comprising recurring units of the general formula (1) and having a weight average molecular weight of 3,000 to 500,000, wherein R1 to R4 are each independently a monovalent C1-C8 hydrocarbon group, m is an integer of 1 to 100, a, b, c and d are each independently 0 or a positive number, e and f each are a positive number, and a+b+c+d+e+f=1,
X is an organic group having the general formula (2): wherein Z is a divalent organic group selected from the group consisting of the broken line segment denotes a valence bond, n is 0 or 1, R5 and R6 are each independently a C1-C4 alkyl or alkoxy group, k is 0, 1 or 2,
Y is an organic group having the general formula (3): wherein V is a divalent organic group selected from the group consisting of the broken line segment denotes a valence bond, p is 0 or 1, R7 and R8 are each independently a C1-C4 alkyl or alkoxy group, h is 0, 1 or 2, and
W is an organic group having the general formula (4): wherein the broken line segment denotes a valence bond, R is hydrogen or a straight or branched C1-C6 alkyl group, and T is a straight, branched or cyclic C1-C12 alkylene group. |
地址 |
Tokyo JP |