FILM DEPOSITION APPARATUS

摘要

PROBLEM TO BE SOLVED: To provide a film deposition apparatus which can suppress a decrease in sealing performance of an opening and closing mechanism for closing a plasma passage port connecting the inside of a storage chamber and the inside of a plasma chamber.SOLUTION: A film deposition apparatus comprises: a storage chamber in which a workpiece is stored; a plasma chamber that generates plasma; a barrier that has a plasma passage port disposed between the storage chamber and the plasma chamber to connect the inside of the storage chamber and the inside of the plasma chamber to each other and is arranged with an annular seal ring around the periphery of the plasma passage port; an opening and closing mechanism that has a valve plate arrangeable on the barrier to close the plasma passage port and moves the valve plate to open and close the plasma passage port; and a protection mechanism that has an annular cover plate that is arranged on the surface of the seal ring and at the periphery of the plasma passage port of the barrier in a state where the plasma passage port is not closed by the valve plate.SELECTED DRAWING: Figure 1