PURPOSE: A nitride semiconductor light emitting diode is provided to improve the crystallization of a contact layer by inserting at least one doped p-type nitride film having low concentration on a contact layer. CONSTITUTION: A light emitting structure includes a p-type nitride semiconductor layer(16) and an n-type nitride semiconductor layer(14). The light emitting structure includes an active layer(15) formed between the semiconductor layers. A p-type electrode is electrically connected to the p-type nitride semiconductor layer. An n-type electrode is electrically connected to the n-type nitride semiconductor layer. A contact layer(17) is positioned between the p-type nitride semiconductor layer and the p-type electrode.
申请公布号
KR20130005495(A)
申请公布日期
2013.01.16
申请号
KR20110066925
申请日期
2011.07.06
申请人
SAMSUNG ELECTRONICS CO., LTD.
发明人
SHIM, HYUN WOOK;LEE, DONG JU;SHIN, DONG IK;KIM, YOUNG SUN;CHEON JOO YOUNG;SOHN, YU RI