发明名称 WAFER INSPECTION DEVICE
摘要 PURPOSE: A wafer inspection device is provided to remove a non-test region on the surface of a wafer and to implement a correct inspection. CONSTITUTION: A photographing device photographs the surface of wafer from a lower direction to an upper direction. An inspection space forming apparatus(200) is arranged in the upper part of the photographing device. The inspection space forming apparatus forms the inspection space for inspecting the surface of a wafer. A surface light source member is formed in the inspection space forming apparatus. A first transfer apparatus(300) and a second transfer apparatus(400) transfer the wafer.
申请公布号 KR20130005483(A) 申请公布日期 2013.01.16
申请号 KR20110066902 申请日期 2011.07.06
申请人 HANMISEMICONDUCTOR CO., LTD. 发明人 KOO, CHANG KEUN;CHOI, DOO HWAN
分类号 H01L21/66 主分类号 H01L21/66
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