发明名称 Cell architecture and method
摘要 A method includes selecting a cell stored in a non-transient computer readable storage medium, arranging a plurality of the cells on a model of a semiconductor device, and creating a mask for the semiconductor device based on the model of the semiconductor device. The cell is designed according to a design rule in which a first power-supply-connection via satisfies a criterion from the group consisting of: i) the first power-supply-connection via is spaced apart from a second power-supply-connection via by a distance that is greater than a threshold distance such that the cell can be fabricated by a single-photolithography single-etch process, or ii) the first power-supply-connection via is coupled to first and second substantially parallel conductive lines that extend along directly adjacent tracks.
申请公布号 US8356262(B1) 申请公布日期 2013.01.15
申请号 US201113207506 申请日期 2011.08.11
申请人 TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.;LU LEE-CHUNG;TIEN LI-CHUN;LIN SHYUE-SHYH;JIANG ZHE-WEI 发明人 LU LEE-CHUNG;TIEN LI-CHUN;LIN SHYUE-SHYH;JIANG ZHE-WEI
分类号 G06F17/50;H01L21/44;H01L23/48;H01L23/52;H01L29/40 主分类号 G06F17/50
代理机构 代理人
主权项
地址