发明名称 |
Cell architecture and method |
摘要 |
A method includes selecting a cell stored in a non-transient computer readable storage medium, arranging a plurality of the cells on a model of a semiconductor device, and creating a mask for the semiconductor device based on the model of the semiconductor device. The cell is designed according to a design rule in which a first power-supply-connection via satisfies a criterion from the group consisting of: i) the first power-supply-connection via is spaced apart from a second power-supply-connection via by a distance that is greater than a threshold distance such that the cell can be fabricated by a single-photolithography single-etch process, or ii) the first power-supply-connection via is coupled to first and second substantially parallel conductive lines that extend along directly adjacent tracks.
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申请公布号 |
US8356262(B1) |
申请公布日期 |
2013.01.15 |
申请号 |
US201113207506 |
申请日期 |
2011.08.11 |
申请人 |
TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.;LU LEE-CHUNG;TIEN LI-CHUN;LIN SHYUE-SHYH;JIANG ZHE-WEI |
发明人 |
LU LEE-CHUNG;TIEN LI-CHUN;LIN SHYUE-SHYH;JIANG ZHE-WEI |
分类号 |
G06F17/50;H01L21/44;H01L23/48;H01L23/52;H01L29/40 |
主分类号 |
G06F17/50 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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