发明名称 Structures including passivated germanium
摘要 A passivated germanium surface that is a germanium carbide material formed on and in contact with the termanium material. An intermediate semiconductor device structure and a semiconductor device structure, each of which comprises the passivated germanium having germanium carbide material thereon, are also disclosed.
申请公布号 US8354738(B2) 申请公布日期 2013.01.15
申请号 US201113072182 申请日期 2011.03.25
申请人 ROUND ROCK RESEARCH, LLC;FORBES LEONARD;AHN KIE Y. 发明人 FORBES LEONARD;AHN KIE Y.
分类号 H01L29/06 主分类号 H01L29/06
代理机构 代理人
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