| 摘要 |
PURPOSE: A pattern formation method is provided to stably forming highly precise micro-patterns. CONSTITUTION: A pattern formation method comprises the following steps: forming a resist film by coating a substrate with a resin composition; exposing the resist film; and developing the resist film by using a negative developer containing an organic solvent. The resin composition includes a specific resin. The specific resin has one or more recurring units having a partial structure which includes alicyclic hydrocarbon represented by chemical formula pI or pII. |
