发明名称 |
CONTROL APPARATUS, A SUBSTRATE TREATING METHOD, A SUBSTRATE TREATING SYSTEM, A METHOD OF OPERATING A SUBSTRATE TREATING SYSTEM, A LOAD PORT CONTROL APPARATUS, AND A SUBSTRATE TREATING SYSTEM HAVING THE LOAD PORT CONTROL APPARATUS |
摘要 |
<p>PURPOSE: A control apparatus, a substrate treating method, a substrate treating system, a method for operating a substrate treating system, a load port control apparatus, and a substrate treating system having the load port control apparatus are provided to reduce costs. CONSTITUTION: A substrate processing apparatus(5) includes a substrate processing unit(11) a load port(13) and an internal buffer(15). The substrate processing unit processes a substrate(W) selected from a FOUP(3). The load port gives and takes the FOUP between the substrate processing apparatus and a carrier transport system(7). The internal buffer is installed between the substrate processing unit and the load port. A host computer(9) communicates the substrate processing apparatus with the carrier transport system. [Reference numerals] (9) Host computer</p> |
申请公布号 |
KR20130005231(A) |
申请公布日期 |
2013.01.15 |
申请号 |
KR20120071319 |
申请日期 |
2012.06.29 |
申请人 |
DAINIPPON SCREEN MFG. CO., LTD. |
发明人 |
SHIBATA HIDEKI |
分类号 |
H01L21/677 |
主分类号 |
H01L21/677 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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