发明名称 CONTROL APPARATUS, A SUBSTRATE TREATING METHOD, A SUBSTRATE TREATING SYSTEM, A METHOD OF OPERATING A SUBSTRATE TREATING SYSTEM, A LOAD PORT CONTROL APPARATUS, AND A SUBSTRATE TREATING SYSTEM HAVING THE LOAD PORT CONTROL APPARATUS
摘要 <p>PURPOSE: A control apparatus, a substrate treating method, a substrate treating system, a method for operating a substrate treating system, a load port control apparatus, and a substrate treating system having the load port control apparatus are provided to reduce costs. CONSTITUTION: A substrate processing apparatus(5) includes a substrate processing unit(11) a load port(13) and an internal buffer(15). The substrate processing unit processes a substrate(W) selected from a FOUP(3). The load port gives and takes the FOUP between the substrate processing apparatus and a carrier transport system(7). The internal buffer is installed between the substrate processing unit and the load port. A host computer(9) communicates the substrate processing apparatus with the carrier transport system. [Reference numerals] (9) Host computer</p>
申请公布号 KR20130005231(A) 申请公布日期 2013.01.15
申请号 KR20120071319 申请日期 2012.06.29
申请人 DAINIPPON SCREEN MFG. CO., LTD. 发明人 SHIBATA HIDEKI
分类号 H01L21/677 主分类号 H01L21/677
代理机构 代理人
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