发明名称 Susceptor for heat treatment and heat treatment apparatus
摘要 A susceptor for holding a semiconductor wafer to be flash-heated by a flash of light emitted from flash lamps is formed of transparent quartz. The susceptor has a backside surface only which is roughened by shot blasting to provide a ground-glass-like surface. When a flash of light is emitted, part of the flash of light emitted from the flash lamps and passing by a peripheral portion of the semiconductor wafer held by the susceptor into the susceptor reaches the ground-glass-like backside surface and is diffusely reflected therefrom. Part of the diffusely reflected light impinges on the peripheral portion of the semiconductor wafer held by the susceptor to thereby heat the low temperature regions which have appeared in the peripheral portion of the semiconductor wafer.
申请公布号 US8355624(B2) 申请公布日期 2013.01.15
申请号 US20070832682 申请日期 2007.08.02
申请人 DAINIPPON SCREEN MFG. CO., LTD.;KOBAYASHI IPPEI;ITO YOSHIO;WADA AKIO;YOKOUCHI KENICHI 发明人 KOBAYASHI IPPEI;ITO YOSHIO;WADA AKIO;YOKOUCHI KENICHI
分类号 A21B2/00 主分类号 A21B2/00
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