| 摘要 |
PURPOSE: A cleaning apparatus of a semiconductor device and a cleaning method thereof are provided to implement the uniformity of a semiconductor device by spreading chemicals on a substrate for constant time. CONSTITUTION: A first nozzle(24A) having a chemical hole(32A) and a second nozzle(24B) having a rinse hole(32B) are arranged on a semiconductor substrate. The first nozzle and the second nozzle are supported by a nozzle support part(31). The semiconductor substrate is cleaned with a chemical solution spread through the chemical hole. The semiconductor substrate is rinsed with a rinse solution spread through the rinse hole.
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