| 摘要 |
An exposure method comprises: forming an immersion region (LR) on a substrate (P); exposing the substrate (P) by irradiating the substrate (P) with an exposure light (EL) via a liquid (LQ) of the immersion region (LR); and preventing an integration value of a contact time during which the liquid (LQ) of the immersion region (LR) and a first region (S1 to S37, 101) on the substrate (P) are in contact, from exceeding a predetermined tolerance value. |
