发明名称 METHOD FOR MANUFACTURING GROUP III NITRIDE SEMICONDUCTOR LIGHT-EMITTING ELEMENT
摘要 <P>PROBLEM TO BE SOLVED: To improve luminous efficiency by optimizing an Al composition ratio of a barrier layer of a light-emitting layer depending on a light-emitting wavelength. <P>SOLUTION: On forming a light-emitting layer of an MQW structure in which a well layer of InGaN and a barrier layer of AlGaN are sequentially and repeatedly formed, the well layer 130 and the barrier layer 131 are formed so as to satisfy the following expressions when an Al composition ratio of the barrier layer 131 is x (%), and a difference between bandgap energy of the barrier layer 131 and bandgap energy of the well layer 130 is y (eV): 12.9&le;-2.8x+100y&le;37 and 0.65&le;y&le;0.86. Alternatively, the well layer 130 and the barrier layer 131 are formed so as to satisfy the following expressions when the Al composition ratio of the barrier layer 131 is x (%) and an In composition ratio of the well layer 130 is z (%): 162.9&le;7.1x+10z&le;216.1 and 3.1&le;z&le;9.2. <P>COPYRIGHT: (C)2013,JPO&INPIT
申请公布号 JP2013008803(A) 申请公布日期 2013.01.10
申请号 JP20110139869 申请日期 2011.06.23
申请人 TOYODA GOSEI CO LTD 发明人 NAKAMURA AKIRA
分类号 H01L33/32;H01S5/343 主分类号 H01L33/32
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