发明名称 |
PROCESS FOR MANUFACTURING SEMICONDUCTOR STRUCTURE USING TEMPORARY BONDING |
摘要 |
<P>PROBLEM TO BE SOLVED: To provide a process for manufacturing a semiconductor structure. <P>SOLUTION: A process for manufacturing the semiconductor structure includes the following steps of: a step (E1) of providing handling substrates (1 and 2) including a seed substrate (1) and a sacrifice layer (2) which covers the seed substrate (1) and is weakened; a step (E2) of joining the handling substrates (1 and 2) and a carrier substrate (3) to each other; a step (E3) of optionally processing the carrier substrate (3); a step (E4) of separating the handling substrates in the sacrifice layer (2), and forming a semiconductor structure; and a step (E5) of removing a residue of the sacrifice layer (2) existing on the seed substrate (1) when the residue exists. <P>COPYRIGHT: (C)2013,JPO&INPIT |
申请公布号 |
JP2013008968(A) |
申请公布日期 |
2013.01.10 |
申请号 |
JP20120138156 |
申请日期 |
2012.06.19 |
申请人 |
SOYTEC |
发明人 |
FABRICE LETERTRE;LANDRU DIDIER |
分类号 |
H01L21/02;H01L21/265;H01L27/12 |
主分类号 |
H01L21/02 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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