发明名称 |
FLUORINE-FREE FUSED RING HETEROAROMATIC PHOTOACID GENERATORS AND RESIST COMPOSITIONS CONTAINING THE SAME |
摘要 |
The present invention relates to a fluorine-free photoacid generator (PAG) and a photoresist composition containing the same. The PAG is characterized by the presence of an onium cationic component and a fluorine-free fused ring heteroaromatic sulfonate anionic component containing one or more electron withdrawing substituents. The onium cationic component of the PAG is preferably a sulfonium or an iodonium cation. The photoresist composition further contains an acid sensitive imaging polymer. The photoresist composition is especially useful for forming material patterns on a semiconductor substrate using 193 nm (ArF) lithography.
|
申请公布号 |
US2013011790(A1) |
申请公布日期 |
2013.01.10 |
申请号 |
US201213617819 |
申请日期 |
2012.09.14 |
申请人 |
INTERNATIONAL BUSINESS MACHINES CORPORATION;LIU SEN;VARANASI PUSHKARA R. |
发明人 |
LIU SEN;VARANASI PUSHKARA R. |
分类号 |
C07D333/62;G03F7/027;G03F7/20 |
主分类号 |
C07D333/62 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|