发明名称 SEMICONDUCTOR DEVICE
摘要 <P>PROBLEM TO BE SOLVED: To provide a semiconductor device capable of improving driving force properties and interruption properties of a FET. <P>SOLUTION: There is provided a semiconductor device comprising a semiconductor substrate, and a semiconductor element formed on the semiconductor substrate and formed of a FET capable of varying a threshold voltage between an OFF state and an ON state. The semiconductor element comprises: an insulating film formed above a portion of the semiconductor substrate on which a channel is formed; a gate electrode provided above the insulating film; and a charge-trapping film interposed between the insulating film and the gate electrode and transmits and receives a greater number of electrons to and from the gate electrode than to and from the channel. <P>COPYRIGHT: (C)2013,JPO&INPIT
申请公布号 JP2013008801(A) 申请公布日期 2013.01.10
申请号 JP20110139794 申请日期 2011.06.23
申请人 TOSHIBA CORP 发明人 TATSUMURA KOSUKE;KAWANAKA SHIGERU;KAWASUMI ATSUSHI;YASUDA NAOKI;FUJIKI JUN
分类号 H01L21/8247;H01L21/336;H01L21/82;H01L21/822;H01L21/8234;H01L21/8238;H01L27/04;H01L27/088;H01L27/092;H01L27/105;H01L27/115;H01L29/78;H01L29/788;H01L29/792;H03K3/356 主分类号 H01L21/8247
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