| 摘要 |
<P>PROBLEM TO BE SOLVED: To obtain a sacrificial film pattern having a highly accurate flat shape and a sidewall shape of 85° or larger and smalleer than 90° without a defective loss and excellent in heat resistance. <P>SOLUTION: A method for manufacturing a micro-structure including (i) a step of forming an inorganic material film on the sacrificial film to form a space having the contour of the sacrificial film pattern includes steps of (A) coating a substrate as the sacrificial film with an optically patternable sacrificial film-forming composition including a cresol novolac resin in which a part or all of phenolic hydroxyl groups is esterified with 1,2-naphthoquinone diazide sulfonic acid halide, a crosslinker, and a photoacid generator having the highest absorption maximum in a wavelength range of 200-300 nm, (B) heating the substrate, (C) executing irradiation along a pattern layout image, (D) forming the sacrificial film pattern, and (E) forming crosslinks within the cresol novolac resin in the sacrificial film pattern. <P>COPYRIGHT: (C)2013,JPO&INPIT |
