| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a polyimide composition capable of forming a polyimide film at a low temperature, which can develop excellent wear resistance. <P>SOLUTION: The polyimide composition is one used for coating a member of a copying machine, and contains a polyimide solution obtained by mixing a polyamic acid, a dehydration cyclization reagent and a solvent. The polyamic acid preferably has a structure represented by formula (I) wherein X and Y are each independently a divalent organic group; Z<SP POS="POST">1</SP>, Z<SP POS="POST">2</SP>and Z<SP POS="POST">3</SP>are each independently hydrogen, fluorine, chlorine, bromine or iodine; and p is 0 or 1. <P>COPYRIGHT: (C)2013,JPO&INPIT |
