| 摘要 |
In a manufacturing method for a solid-state imaging device, a photoelectric conversion portion including a first impurity layer whose carrier polarity is a first conductivity type is formed within a substrate, a second impurity layer, whose carrier polarity is a second conductivity type opposite to the first conductivity type, is formed on a surface of the first impurity layer so as to be in contact with the surface located on one surface side of the substrate, a third impurity layer, whose carrier polarity is the first conductivity type, is formed on the second impurity layer so as to be in contact therewith, a gate electrode is formed above the third impurity layer so as to cover the third impurity layer, and an impurity region portion, whose carrier polarity is the first conductivity type, is formed within the substrate so as to be connected to the third impurity layer. |
