| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a target which can discharge in a stable manner for a long period and enable good deposition, even when a metal oxide film is formed by reactive sputtering. <P>SOLUTION: The target 3<SB POS="POST">1</SB>for sputtering is arranged together with a substrate to be processed in a sputtering chamber, and is subjected to sputtering while gas containing at least oxygen is introduced during sputtering. An insulation plate 8 is affixed in a region where oxide of elements constituting the target can adhere and deposit, in a sputtering surface 3a of the target. <P>COPYRIGHT: (C)2013,JPO&INPIT |
