发明名称 |
ANTENNA, DIELECTRIC WINDOW, PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD |
摘要 |
An antenna, a dielectric window, a plasma processing apparatus and a plasma processing method are capable of improving uniformity of a substrate surface processing amount in the surface of the substrate. The antenna includes the dielectric window 16; and a slot plate 20, provided on one side of the dielectric window 16, having a plurality of slots 133. The dielectric window 16 has a flat surface 146 surrounded by a ring-shaped first recess; and a plurality of second recesses 153 formed on the flat surface 146 so as to surround a center of the flat surface 146. Here, the flat surface 146 is formed on the other side of the dielectric window 16. When viewed from a thickness direction of the slot plate, a center of each second recess 153 is located within each slot 133 of the slot plate.
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申请公布号 |
US2013008607(A1) |
申请公布日期 |
2013.01.10 |
申请号 |
US201213541940 |
申请日期 |
2012.07.05 |
申请人 |
TOKYO ELECTRON LIMITED;MATSUMOTO NAOKI;YOSHIKAWA WATARU;YOSHIKAWA JUN;MOYAMA KAZUKI;ISHIBASHI KIYOTAKA;MORITA OSAMU;TANIKAWA TAKEHIRO |
发明人 |
MATSUMOTO NAOKI;YOSHIKAWA WATARU;YOSHIKAWA JUN;MOYAMA KAZUKI;ISHIBASHI KIYOTAKA;MORITA OSAMU;TANIKAWA TAKEHIRO |
分类号 |
H01Q13/10;B05C11/00 |
主分类号 |
H01Q13/10 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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