摘要 |
<p>Metal-oxide films for lithographic applications are provided. The films are formed from compositions comprising metal-oxide precursor compounds including metals and metalloids other than silicon. These films are easily produced and can be modified with a variety of ligands, including alkoxides, phenoxides, carboxylates, beta-diketones, and beta-ketoesters.</p> |
申请人 |
BREWER SCIENCE INC.;SULLIVAN, DANIEL M.;NEEF, CHARLES J.;WANG, YUBAO;OUATTARA, TANTIBORO |
发明人 |
SULLIVAN, DANIEL M.;NEEF, CHARLES J.;WANG, YUBAO;OUATTARA, TANTIBORO |